Patterning of oxide-hardened gold black by photolithography and metal lift-off

Deep Panjwani; Mehmet Yesiltas; Janardan Nath; D.E. Maukonen; Imen Rezadad; Evan M. Smith; R.E. Peale; Carol Hirschmugl; Julia Sedlmair; Ralf Wehlitz; Miriam Unger; Glenn Boreman

doi:10.1016/j.infrared.2013.11.005

Treesearch

Patterning of oxide-hardened gold black by photolithography and metal lift-off

Formally Refereed

Authors:

Deep Panjwani, Mehmet Yesiltas, Janardan Nath, D.E. Maukonen, Imen Rezadad, Evan M. Smith, R.E. Peale, Carol Hirschmugl, Julia Sedlmair, Ralf Wehlitz, Miriam Unger, Glenn Boreman

Year:

2014

Type:

Scientific Journal

Station:

Forest Products Laboratory

DOI:

https://doi.org/10.1016/j.infrared.2013.11.005

Source:

Infrared Physics & Technology, Volume 62, 2014; pp. 94–99.

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Abstract

A method to pattern infrared-absorbing gold black by conventional photolithography and lift-off is described. A photo-resist pattern is developed on a substrate by standard photolithography. Gold black is deposited over the whole by thermal evaporation in an inert gas at ~ 1 Torr. SiO₂ is then deposited as a protection layer by electron beam evaporation. Lift-off proceeds by dissolving the photoresist in acetone. The resulting sub-millimeter size gold black patterns that remain on the substrate retain high infrared absorption out to ~5 μm wavelength and exhibit good mechanical stability. This technique allows selective application of gold black coatings to the pixels of thermal infrared imaging array detectors.

Keywords

Gold black, Pattering, MEMS, Photolithography, Infrared, Bolometer

Citation

Panjwani, Deep; Yesiltas, Mehmet; Nath, Janardan; Maukonen, D.E.; Rezadad, Imen; Smith, Evan M.; Peale, R.E.; Hirschmugl, Carol; Sedlmair, Julia; Wehlitz, Ralf; Unger, Miriam; Boreman, Glenn. 2014. Patterning of oxide-hardened gold black by photolithography and metal lift-off. Infrared Physics & Technology, Volume 62, 2014; pp. 94–99.